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Electron beam lithography equipment Product List

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Electron Beam Drawing Device 'CABL-UH'

A new structure of the telescope tube has been developed that hardly generates any micro-discharges, achieving stable operation for extended periods.

The "CABL-UH" is an electron beam lithography system that enables finer processing due to reduced forward scattering of electrons within the resist, achieved by adopting a high acceleration voltage. The 130kV acceleration voltage is generated through a single-stage acceleration, resulting in a shorter structure compared to conventional multi-stage accelerated electron guns. This single-stage acceleration design has realized an electron optical system with low aberration and minimal Coulomb blur. Additionally, we offer a lineup of 110kV and 90kV options to suit our customers' applications and budgets. Please feel free to contact us. 【Features】 ■ Adoption of high acceleration voltage ■ Reduced forward scattering of electrons within the resist ■ Capability for finer processing ■ High-resolution drawing possible with high current * You can download the English catalog. * For more details, please refer to the PDF materials or feel free to contact us.

  • Other processing machines
  • Electron beam lithography equipment

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